CAM-Workshop Program 2024

Day 1 (4. June 2024)

Session A: Welcome and Keynotes

09:00 – 09:20 Prof. Dr. Erica Lilleodden /  Frank Altmann Fraunhofer IMWS (DE) Welcome
09:20 – 10:00 Frank Fournel CEA-Leti (F) Keynote: Characterisation needs in wafer-to-wafer and die-to-wafer direct bonding
10:00 – 10:40 Anton Chichkov Chips Joint Undertaking (BE) Keynote: EU Chips Act – An Introduction

Session B: Heterogeneous Integration

11:20 – 11:40 Serena Iacovo  IMEC (BE) A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage
11:40 – 12:00 Sebastian Quednau NanoWired (DE) Assembly and Interconnection Technology with Nanowires
12:00 – 12:20 Torsten Grawunder Swissbit Germany AG (DE) Open Advanced Packaging / Micro Integration Foundry as a model for one manufacturing platform with integrated LAB-in-the-FAB concept
12:20 – 12:40 Sebastian Brand Fraunhofer IMWS (DE) Approaches in High Resolution Non-destructive Defect Localization to meet current and Future Integration Challenges
12:40 – 13:00 Jan Proschwitz Intel (DE) Robustnes and reliability testing for heterointegration
13:00 – 13:20 Dirk Schade XYZTec (DE) Revolutionizing semiconductor testing: The power of automation in testing chiplets

Session C: Novel Failure Analysis Techniques

14:40 – 15:00 Sven Kayser IONTOF GmbH (DE) Hybrid SIMS: New possibilities for advanced semiconductor structure analysis with Self-Focusing SIMS
15:00 – 15:20 Wenbing Yun Sigray (US) XADA: X-ray Assisted Device Alteration for Future Generations of ICs with Backside Power Distribution Network
15:20 – 15:40 Rene Hammer Point Electronic GmbH (DE) Advances in EFA with color coded multi-channel nanoprobing
15:40 – 16:00 Thomas Adlmaier Infineon Technologies Dresden GmbH (DE) Advancing the Quantification Workflow for 2D Charge Carrier Profiling by Scanning Spreading Resistance Microscopy
16:00 – 16:20 Anjanashree RM Sharma IMEC and KU Leuven (BE) Failure analysis methodologies for silicon photonics devices

Session D: Panel Discussion

Day 2 (5. June 2024)

Session E: Tutorial

Session F: Wide Band Gap Power Electronics

09:40 – 10:20 Peter Friedrichs Infineon Technologies AG (DE) Keynote: SiC power devices and related robustness and reliability aspects
10:20 – 10:40 Habib Mustain Heraeus (USA) Robustness for power electronic packaging
10:40 – 11:00 Dick Scholten Robert Bosch GmbH (DE) Gate-switching instability in silicon carbide power MOSFET’s
11:00 – 11:20 Andreas Graff Fraunhofer IWMS (DE) Diamond Nanomembrane Technology for Power Electronic Applications
11:20 – 11:40 Antoine Reverdy Sector Technologies (FR) Power devices Failure Analysis Use Cases Using High voltage OBIRCh workflows

Session G: Failure Analysis Workflows and Digitalization

13:00 – 13:40 Prof. Dr. Zhiheng Huang Sun Yat-sen University (CN) Keynote: Applied Microstructure for AI: From Electrons to Devices & From Diagnostics to Informatics
13:40 – 14:00 Allen Gu Carl Zeiss Microscopy GmbH(DE) An Artificial Intelligence Powered Reconstruction and Metrology Workflow for Semiconductor Packaging Development using High-Resolution 3D X-ray Microscopy
14:00 – 14:20 Amit Kumar Choudhary Matworks GmbH (DE) ML assisted defect detection for reliable failure analysis in microelectronic components
14:20 – 14:40 Fabian Rudau Robert Bosch GmbH (DE) In Depth Logic Analysis on Digital Designs
14:40 – 15:00 Christian Hollerith Infineon AG (DE) Integrated Workflows for Failure Analysis
15:00 – 15:20 Libor Strakoš Thermo Fisher Scientific (CZ) In-situ AFM-in-(FIB)SEM workflow for site-specific & correlative failure analysis of semiconductors
15:20 – 15:40 Oscar Recalde Kleindiek Nanotechnik GmbH (DE) Automated SEM/EBIC Workflow for Wafer Level Failure Analysis